Welcome. I'm a scientist at the Center for X-ray Optics (CXRO) at Lawrence Berkeley National Laboratory (LBNL). Since 2005, I have been working on issues related to short wavelength extreme ultraviolet (EUV) optical systems, specifically those used for EUV Lithography. I design and model EUV lithographyic systems, develop control software, study metrology techniques, evaluate EUV photoresist, and mentor graduate and undergraduate students.

November 21 2008, Amsterdam. The finals for the Meltwater Scholarship. For more info check out this article (Daily Californian).